Manganese silicide is a transition metal silicide and a kind of refractory intermetallic compound. Due to its unique physical and chemical properties, it has been successfully applied in the fields of cmos components, thin film coatings, bulk structural components, heating elements, thermoelectric materials and photovoltaic materials. The nanomaterials have special electrical, optical, magnetic and thermoelectric properties, and even have potential applications in the field of catalysis. However, the traditional preparation methods such as metallurgical or physical methods cannot satisfy the preparation of transition metal silicide nanomaterials. Therefore, it is of great significance to find a simple and widely applicable preparation method for the wide application of transition metal silicide nanomaterials.