Manganese silicide is a transition metal silicide and a kind of
refractory intermetallic compound. Due to its unique physical and chemical
properties, it has been successfully applied in the fields of cmos components,
thin film coatings, bulk structural components, heating elements,
thermoelectric materials and photovoltaic materials. The nanomaterials have
special electrical, optical, magnetic and thermoelectric properties, and even
have potential applications in the field of catalysis. However, the traditional
preparation methods such as metallurgical or physical methods cannot satisfy
the preparation of transition metal silicide nanomaterials. Therefore, it is of
great significance to find a simple and widely applicable preparation method
for the wide application of transition metal silicide nanomaterials.
